Free SKILL.md scraped from GitHub. Clone the repo or copy the file directly into your Claude Code skills directory.
npx versuz@latest install a5c-ai-babysitter-library-specializations-domains-science-nanotechnology-skills-algit clone https://github.com/a5c-ai/babysitter.gitcp babysitter/SKILL.MD ~/.claude/skills/a5c-ai-babysitter-library-specializations-domains-science-nanotechnology-skills-al/SKILL.md---
name: ald-process-controller
description: Atomic Layer Deposition skill for conformal thin film deposition with atomic-level thickness control
allowed-tools:
- Read
- Write
- Glob
- Grep
- Bash
metadata:
specialization: nanotechnology
domain: science
category: fabrication
priority: high
phase: 6
tools-libraries:
- ALD process simulators
- Quartz crystal microbalance analysis
---
# ALD Process Controller
## Purpose
The ALD Process Controller skill provides comprehensive atomic layer deposition process control, enabling conformal thin film growth with atomic-level precision through optimized pulse sequences and in-situ monitoring.
## Capabilities
- Precursor pulse/purge optimization
- Growth per cycle (GPC) characterization
- Film uniformity mapping
- Conformality assessment
- In-situ monitoring integration
- Multi-component film design
## Usage Guidelines
### ALD Process Control
1. **Saturation Studies**
- Vary pulse times
- Identify saturation dose
- Optimize purge times
2. **Process Window**
- Determine ALD window
- Optimize temperature
- Monitor GPC stability
3. **Film Quality**
- Characterize uniformity
- Measure conformality
- Assess impurity levels
## Process Integration
- Thin Film Deposition Process Optimization
- Nanodevice Integration Process Flow
## Input Schema
```json
{
"material": "string",
"precursor_a": "string",
"precursor_b": "string",
"target_thickness": "number (nm)",
"substrate": "string",
"temperature": "number (C)"
}
```
## Output Schema
```json
{
"optimized_recipe": {
"precursor_a_pulse": "number (s)",
"purge_a": "number (s)",
"precursor_b_pulse": "number (s)",
"purge_b": "number (s)"
},
"gpc": "number (Angstrom/cycle)",
"cycles_required": "number",
"uniformity": "number (%)",
"conformality": "number (% step coverage)"
}
```