Free SKILL.md scraped from GitHub. Clone the repo or copy the file directly into your Claude Code skills directory.
npx versuz@latest install a5c-ai-babysitter-library-specializations-domains-science-nanotechnology-skills-dsgit clone https://github.com/a5c-ai/babysitter.gitcp babysitter/SKILL.MD ~/.claude/skills/a5c-ai-babysitter-library-specializations-domains-science-nanotechnology-skills-ds/SKILL.md---
name: dsa-process-controller
description: Directed Self-Assembly skill for block copolymer lithography and nanoparticle templating
allowed-tools:
- Read
- Write
- Glob
- Grep
- Bash
metadata:
specialization: nanotechnology
domain: science
category: fabrication
priority: medium
phase: 6
tools-libraries:
- BCP simulation tools
- SCFT (Self-Consistent Field Theory)
---
# DSA Process Controller
## Purpose
The DSA Process Controller skill provides directed self-assembly process control for block copolymer lithography and nanoparticle templating, enabling sub-lithographic patterning through controlled polymer phase separation.
## Capabilities
- Block copolymer selection and design
- Annealing protocol optimization
- Defect density analysis
- Pattern transfer protocols
- Graphoepitaxy and chemoepitaxy
- Long-range order characterization
## Usage Guidelines
### DSA Process Control
1. **BCP Selection**
- Match pitch to target
- Consider chi-N product
- Select morphology (lamellar, cylindrical)
2. **Annealing Optimization**
- Choose thermal vs solvent vapor
- Optimize temperature/time
- Achieve equilibrium morphology
3. **Defect Analysis**
- Classify defect types
- Quantify defect density
- Identify root causes
## Process Integration
- Directed Self-Assembly Process Development
- Nanolithography Process Development
## Input Schema
```json
{
"bcp_system": "string (e.g., PS-b-PMMA)",
"target_pitch": "number (nm)",
"morphology": "lamellar|cylindrical|spherical",
"guiding_type": "graphoepitaxy|chemoepitaxy",
"substrate_pattern": "string"
}
```
## Output Schema
```json
{
"annealing_protocol": {
"method": "thermal|svA",
"temperature": "number (C)",
"time": "number (hours)",
"solvent": "string (optional)"
},
"achieved_pitch": "number (nm)",
"defect_density": "number (defects/um2)",
"correlation_length": "number (nm)",
"pattern_quality": "string"
}
```